University
of California, Santa Barbara
Department of Electrical and
Computer Engineering
Semiconductor
Device Processing
ECE
120A – Winter 2015
Instructor: Dr. Ilan Ben-Yaacov
Schedule:
Tues/Thurs 11:00am - 12:15pm, North Hall Room 1111
Announcements
3/3/15: Some example exam problems, along with
the tables/graphs that will be provided on the exam, are posted here.
2/24/15: HW5 is now posted below.
2/9/15: HW4 is now posted below.
2/9/15:
Please note that TA lab hours have changed, current hours are listed
below.
1/27/15: HW3 is now posted below. PLEASE NOTE – HW3 DUE DATE HAS CHANGED (see below)!
1/19/15:
Please note that TA lab hours have changed, current hours are listed
below.
1/15/15: HW2 is now posted below.
1/6/15:
Welcome to ECE 120A. HW1 and all handouts are posted on the
class website.
Syllabus
(click here for syllabus in .pdf format)
Time: Tues/Thurs
11:00am – 12:15pm
Place: North
Hall, Room 1111
Instructor: Dr.
Ilan Ben-Yaacov, ESB Room 2213, ext 5295, ilan[at]engineering.ucsb.edu
Office Hours: Tues/Thurs
9:45 – 10:45am
Teaching Assistants: Sandra
Skendzic (sskendzic[at]umail.ucsb.edu), lab hours Thurs 12:30-3:30pm and Fri
10:00am-1:00pm.
Arda Simsek (ardasimsek[at]umail.ucsb.edu),
lab hours MW 2:00-5:00pm.
Lab Supervisor: Bob Hill, Engineering II Room 1141, ext 4142, bob[at]ece.ucsb.edu
Laboratory Hours: There are no
scheduled hours for the lab work. The UCSB Instructional Cleanroom will
be available weekdays from 8am-5pm. For safety reasons, you will not be
permitted to work alone. There will be equipment demonstration sessions,
which are required.
Lab Safety: It
is essential that safety procedures be followed at all times. You will be
working with acids (including HF), bases, and organic solvents that can be
hazardous if not handled properly. You are required to attend a safety
orientation session before you will be permitted to enter the lab. There
are sessions provided by the university, or a series of tapes provided by the
ECE department and Bob Hill.
Required Text: Fundamentals of Semiconductor
Fabrication by G. S.
May and S. M. Sze, published by John Wiley and Sons, 2004, ISBN 0-471-23279-3.
Handouts and class notes will complement the
text. All handouts can be downloaded by clicking on the appropriate link
at the bottom of this website.
Prerequisites: ECE
132 with a grade of C- or better, or equivalent, or consent of the instructor.
Topics to be covered:
Optical Lithography
Thermal Oxidation
Junction Formation
Etching
Thin Film Deposition
Ohmic, Schottky,
and MOS Contact Formation
NMOS Process and Characterization
Course Format: There
will be homework assignments, a midterm, laboratory work, and a final lab
project. Laboratory work will consist of experimenting with various processes
such as lithography, thermal oxidation, and wet etching, and determining
process tolerances. For the final project, you will use the skills you
have developed in the lab to fabricate and characterize a MOS transistor.
Homework, midterm, lab, and final lab project will each contribute 15%, 30%,
15% and 40% to the final grade.
Lab Project 1 – Due Wed, 1/21/15 by 5:00pm
Lab Project 2 – Due Wed, 2/4/15 by 5:00pm
Final Lab PreLab – Due Tues, 2/17/15 by 5:00pm
Final Lab Project – Due Wednesday, 3/18/15 by 5:00pm
Homework 1 – Due
Fri, 1/16/15 by 5:00pm
Homework 2 – Due
Fri, 1/23/15 by 5:00pm
Homework 3 – Due
Fri, 2/6/15 by 5:00pm Tues, 2/10/15 by 5:00pm
Homework 4 – Due
Fri, 2/20/15 by 5:00pm
Homework 5 –
Due Tues, 3/3/15 by 5:00pm
Midterm will be on Thursday, 3/5/15. You will be allowed a calculator and 3 pages
of notes (8.5 by 11 inch, you may write on front and back). Midterm review will be in class on Tuesday
3/315.
NMOS Process Solid Solubilities of Impurities in Silicon
Wafer Scribing
and Cleaning Periodic Table of Elements
HF Safety Tips Lateral Diffusion
Metal Evaporation
– Thermal Evaporator
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